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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Name: U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
Uploaded: 2026-10-13
Duration: 12 min 5 s
Description: Learn to prepare U2O5 thin films via DC sputtering and atomic oxygen/hydrogen treatment under ultra-high vacuum. This method enables precise control over uranium oxide surface composition for advanced materials research.

DOI: 10.3791/59017-v

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